Global Nanoimprint Lithography System Market Revenue and Growth Rate Forecast (2018-2023)
Global Nanoimprint Lithography System Market by Manufacturers, Countries, Type and Application, Forecast to 2023 Report “ Provides In-Depth Analysis Of Parent Market Trends, Macro-Economic Indicators And Governing Factors Along With Market Attractiveness As Per Segments.
Introduction:
Imprinting technology is an ancient technique for the reproduction of writings on appropriate supports. Since 1990′s, one of the imprinting techniques, i.e., injection moulding has been used for compact disk (CD) production. More recently, the semiconductor industry is interested in imprint related techniques because of the mass production requirement of future microelectronic circuits with a possible critical dimension down to a few nanometers. At this deep nanometer scale, traditional photolithography is supposed to rule out because of the optical diffraction or material limitations. In fact, the actual minimum feature size in an integrated circuit (IC) is already less than 50 nm and the actual manufacturing systems are already extremely sophisticated and expensive. The semiconductor industry has always been looking for alternative patterning methods in order to follow Moore′s law, which has been formulated to predict the evolution of the technology nodes. Now, extreme UV lithography (EUV), 193 nm immersion lithography, mask less lithography (MLL) techniques and nanoimprint lithography (NIL) are considered as candidates for the so called Next Generation Lithography (NGL) at 32 nm and 22 nm nodes. In parallel, imprint technology has been promoted by a large scientific community and non-IC industry segments including high-density storage, optoelectronics, telecommunication as well as biochips or micro total analysis systems.
Scope of the Global Nanoimprint Lithography System Market Report
This report focuses on the Nanoimprint Lithography System in Global market, especially in North America, Europe and Asia-Pacific, South America, Middle East and Africa. This report categorizes the market based on manufacturers, regions, type and application.
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This report covers Analysis of Global Nanoimprint Lithography System Market Segment by Manufacturers
Obducat
EV Group
Canon (Molecular Imprints)
Nanonex
SUSS MicroTec
GuangDuo Nano
Global Nanoimprint Lithography System Market Segment by regional analysis covers
North America (USA, Canada and Mexico)
Europe (Germany, France, UK, Russia and Italy)
Asia-Pacific (China, Japan, Korea, India and Southeast Asia)
South America (Brazil, Argentina, Columbia etc.)
Middle East and Africa (Saudi Arabia, UAE, Egypt, Nigeria and South Africa)
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Global Nanoimprint Lithography System Market Segment by Type
Hot Embossing (HE)
UV-based Nanoimprint Lithography (UV-NIL)
Micro Contact Printing (μ-CP)
Global Nanoimprint Lithography System Market Segment by Applications, can be divided into
Consumer Electronics
Optical Equipment
Others
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Some of the Points cover in Global Nanoimprint Lithography System Market Research Report is:
Chapter 1: Describe Nanoimprint Lithography System Industry
Introduction,
Product Scope,
Market Overview,
Market Opportunities,
Market Risk,
Market Driving Force
Chapter 2: To analyze the top manufacturers of Nanoimprint Lithography System Industry in 2016 and 2017
Sales
Revenue and price
Chapter 3: Competitive analysis among the top manufacturers in 2016 and 2017
Sales
Revenue and market share
Chapter 4: Global Nanoimprint Lithography System Market by regions from 2013 to 2018
Sales
Revenue and market share
Chapter 5, 6, 7 and 8: Global Nanoimprint Lithography System Market by key countries in these regions
Sales
Revenue and market share
Chapter 9 and 10: Global Nanoimprint Lithography System Market by type and application from 2013 to 2018
Sales
Revenue and market share
Growth rate
Chapter 11:Nanoimprint Lithography System Industry Market forecast from 2018 to 2023
Regions
Type and application with sales and revenue
Chapter 12 and 13:Nanoimprint Lithography System Industry
Sales channel
Distributors
Traders and dealers
Appendix
Data source
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